Genome DNA hypomethylation in HaCaT cells after short exposure to SiO2 nanoparticles
Gong, C.; Yang, L.; Tao, G.; Liu, Q.; Liu, J.; Zhuang, Z.
Wei Sheng Yan Jiu 42(2): 179-184
2013
ISSN/ISBN: 1000-8020 PMID: 23654090 Document Number: 670403
To observe the effect of SiO2 nanoparticles on genome DNA methylation profile in cultured cells. HaCaT cells were treated with nm-SiO2 at 2.5, 5 and 10 microg/ml and micro-SiO2 at 10 microg/ml for 24h and DAC treatment was given at 10 microg/ml group for 48h. The mC/(mC + C) percent was quantified by high performance capillary electrophoresis (HPCE) assay, and the expression level of mRNA and protein was detected by Real-time Q-PCR and westernblot assay. The activity of DNMTs was determined by DNA Methyltransferase Activity/Inhibition Assay Kit. HPCE assay showed that nm-SiO2-treated cells were decreased in some degree. An average proportion of methylated mC/ (mC + C) was 4.82% in control, 2.7% in 2.5 microg/ml and 2.17% in 10 microg/ml groups, while 3.1% in micro-SiO2 groups, which got the consistent downtrend of genome methylation level during increasing nm-SiO2 dose nanoparticles. The mRNA expression level for DNMT1 decreased gradually with increased dose of nm-SiO2 nanoparticles. The alterations at protein level were similar to those at the mRNA level. Genomic DNA methylation levels were decreased in HaCaT cells after short-term exposure to SiO2 nanoparticles.